Young Hee Lee

Silicon etching mechanism and anisotropy in CF4+O2 plasma

Y. H. Lee, Mao‐Min Chen, Young Hee Lee, 1983 .

Simulation of thin carbon film deposition in a radio-frequency methane plasma reactor

Bakhtier Farouk, K. Bera, B. Farouk, 1999 .

Reactive etching mechanism of tungsten silicide in CF4-O2 plasma☆

A. A. Bright, Kie Y. Ahn, Y. H. Lee, 1984 .