Panagiotis Argitis

发表

Electron-beam lithography on multilayer substrates: experimental and theoretical study

Ioannis Raptis, G. Meneghini, Anja Rosenbusch, 1998, Advanced Lithography.

Exploring the potential of Multiphoton Laser Ablation Lithography (MP-LAL) as a reliable technique for sub-50nm patterning

Panagiotis Argitis, Theodoros Manouras, Evangelos Angelakos, 2016, SPIE Advanced Lithography.

Laser plasma x-ray contact microscopy of living specimens

Colin N. Danson, David Neely, Anthony D. Stead, 1999, Other Conferences.

Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography

Evangelos Gogolides, Ioannis Raptis, George P. Patsis, 2000, Advanced Lithography.

Glass transition temperature studies in thin photoresist films with an interferometric method

Ioannis Raptis, Panagiotis Argitis, Dimitra Niakoula, 2003, SPIE Advanced Lithography.

Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking

Yasin Ekinci, Dimitrios Kazazis, Panagiotis Argitis, 2018, Advanced Lithography.

Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography

Evangelos Gogolides, Kim Dean, Panagiotis Argitis, 2003, SPIE Advanced Lithography.

Removing foxing stains from old paper at 157nm

Zoe Kollia, Panagiotis Argitis, Evangelia Sarantopoulou, 2001, Lasers in Metrology and Art Conservation.

New resist materials based on polyacetal main chain scission

Panagiotis Argitis, Theodoros Manouras, Antonis Olziersky, 2016, SPIE Advanced Lithography.

Exposure of molecular glass resist by e-beam and EUVIL

Panagiotis Argitis, Harun H. Solak, Dimitra Niakoula, 2007, SPIE Advanced Lithography.

Single-pulse high-resolution x-ray contact microscopy with an advanced epoxy novolac resist

Colin N. Danson, A. Marranca, Panagiotis Argitis, 1998, GR-I International Conference on New Laser Technologies and Applications.

Theoretical discussion of diffusion effects in negative chemically amplified resists based on contrast curve simulation

G. Meneghini, George P. Patsis, Nikos Glezos, 1997 .

Fabrication of Si nanodevices by optical lithography and anisotropic etching

Pascal Normand, Panagiotis Argitis, Dimitris Tsoukalas, 1998 .

Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography

Evangelos Gogolides, Panagiotis Argitis, Evangelia Sarantopoulou, 2000 .

Harnessing photochemical internalization with dual degradable nanoparticles for combinatorial photo–chemotherapy

Panagiotis Argitis, Maria Vamvakaki, George Pasparakis, 2014, Nature Communications.

Surface passivation effect by fluorine plasma treatment on ZnO for efficiency and lifetime improvement of inverted polymer solar cells

Evangelos Gogolides, D. Davazoglou, Panagiotis Argitis, 2016 .

Photoresist etch resistance enhancement using novel polycarbocyclic derivatives as additives

Angeliki Tserepi, Evangelos Gogolides, Panagiotis Argitis, 2003 .

Stochastic simulation studies of molecular resists for the 32nm technology node

Evangelos Gogolides, Andreas G. Boudouvis, Ioannis Raptis, 2008 .

Silylation and Dry Development of Chemically Amplified Resists SAL601*, AZPN114*1, and Epoxidised Resist (EPR*1) for High Resolution Electron-Beam Lithography

Zheng Cui, Evangelos Gogolides, Ioannis Raptis, 1998 .

Optical Modeling of Hybrid Polymer Solar Cells Using a Transmission-Line Model and Comparison With Experimental Results

Panagiotis Argitis, Maria Vasilopoulou, M. Vasilopoulou, 2010, IEEE Journal of Selected Topics in Quantum Electronics.

A low temperature surface modification assisted method for bonding plastic substrates

Angeliki Tserepi, Konstantinos Misiakos, Panagiotis Argitis, 2008 .

Photodegradable polymers for biotechnological applications.

Panagiotis Argitis, Maria Vamvakaki, George Pasparakis, 2012, Macromolecular rapid communications.

Calculation of energy deposition in thin resist films over multilayer substrates

Ioannis Raptis, George P. Patsis, Anja Rosenbusch, 1998 .

A transmission line model for the optical simulation of multilayer structures and its application for oblique illumination of an organic solar cell with anisotropic extinction coefficient

Panagiotis Argitis, Stylianos P. Savaidis, N. A. Stathopoulos, 2011 .

Electron beam lithography simulation for high resolution and high-density patterns

Ioannis Raptis, Evangelos Zervas, Nikos Glezos, 2001 .

Laser-induced cell detachment and patterning with photodegradable polymer substrates.

Panagiotis Argitis, Alexandros Selimis, Maria Vamvakaki, 2011, Angewandte Chemie.

F2 LASER (157 nm) LITHOGRAPHY: MATERIALS AND PROCESSES

Angeliki Tserepi, Evangelos Gogolides, Panagiotis Argitis, 2001 .

1-D polymeric photonic crystals as spectroscopic zero-power humidity sensors

Andrzej Budkowski, Jakub Rysz, Panagiotis Argitis, 2014 .

Silylation of epoxy functionalised photoresists for optical, e-beam lithography and micromachining applications

Evangelos Gogolides, Andreas G. Boudouvis, Panagiotis Argitis, 1998 .

Electrochemical biosensor microarray functionalized by means of biomolecule friendly photolithography.

Konstantinos Misiakos, Panagiotis Argitis, Ioanis Katakis, 2010, Biosensors & bioelectronics.

An advanced epoxy novolac resist for fast high-resolution electron-beam lithography

Ioannis Raptis, Nikos Glezos, Panagiotis Argitis, 1995 .