Lin Chua

Reticle intensity-based critical dimension uniformity to improve efficiency for DOMA correction in a foundry

Lei Huang, William Li, Trent Hutchinson, 2012, Advanced Lithography.

Algorithm of Obstacle Detection Based on Binocular Vision

Lin Chua, 2014 .

Impact of pellicle on overlay in double patterning lithography

You Seung Jin, Frank Laske, Klaus-Dieter Roeth, 2011, Advanced Lithography.

Mask registration impact on intrafield on-wafer overlay performance

DongSub Choi, You Seung Jin, Frank Laske, 2011, Advanced Lithography.

Study of overlay in EUV/ArF mix and match lithography

Klaus-Dieter Roeth, John C. Robinson, Dongsub Choi, 2013, Advanced Lithography.