Sz. Kátai

High‐Resolution Thermal Processing of Semiconductors Using Pulsed‐Laser Interference Patterning

Martin Stutzmann, Christoph E. Nebel, M. K. Kelly, 1998 .

Ion beam mass spectrometer for compositional analysis of plasma assisted surface processes in the pressure range of 1–50 mbar

Peter Deák, L. Geelhaar, G. Hárs, 1999 .