Il-Hyuk Yu

Controlling work function and damaging effects of sputtered RuO₂ gate electrodes by changing oxygen gas ratio during sputtering.

Jae Ho Lee, Cheol Seong Hwang, Tae Joo Park, 2013, ACS applied materials & interfaces.

Scaling of equivalent oxide thickness of atomic layer deposited HfO2 film using RuO2 electrodes suppressing the dielectric dead-layer effect

Jae Ho Lee, Cheol Seong Hwang, Tae Joo Park, 2012 .