Yong-hee Lee

An alternative interpretation of hot electron interface degradation in NMOSFETs: isotope results irreconcilable with major defect generation by holes?

K. Hess, J. Lyding, Young-Wug Kim, 1999 .

Effect of low temperature deuterium annealing on plasma process induced damage

B. Kang, K. Hess, J. Lyding, 1999, 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395).

Application of the deuterium sintering process to improve the device design rule in reducing plasma induced damages

K. Hess, J. Lyding, K. Cheng, 1999, International Symposium on Plasma Process-Induced Damage.

Novel method for the preparation of carbon supported nano-sized amorphous ruthenium oxides for supercapacitors

Hansung Kim, Jong-Gil Oh, Hyung‐Suk Oh, 2008 .