D. Feiler

A Cu/low-/spl kappa/ dual damascene interconnect for high performance and low cost integrated circuits

Jie Zhou, C. Vo, D. Young, 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

0.18 /spl mu/m SiGe BiCMOS technology for wireless and 40 Gb/s communication products

M. Racanelli, K. Schuegraf, P. Kempf, 2001, Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212).