Fritz Gans

Impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013 .

The impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013, Advanced Lithography.

The impact of 14nm photomask variability and uncertainty on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013, Photomask Technology.

14-nm photomask simulation sensitivity

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2014, European Mask and Lithography Conference.