Christian Buergel

Impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013 .

The impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013, Advanced Lithography.

Rule-based OPC and MPC interaction for implant layers

Guoxiang Ning, Paul Ackmann, Christian Buergel, 2015, SPIE Photomask Technology.

The impact of 14nm photomask variability and uncertainty on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013, Photomask Technology.

Reticle and wafer CD variation for different dummy pattern

Andre Leschok, Thomas Thamm, Guoxiang Ning, 2012, Photomask Technology.

14-nm photomask simulation sensitivity

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2014, European Mask and Lithography Conference.

Negative Chemically Amplified Resist (nCAR) for DRAM Mask Fabrications

Martin Tschinkl, Armelle Vix, Christian Buergel, 2002, Photomask Technology.