Colin J. Brodsky
发表
J. Braggin,
Colin J. Brodsky,
M. Linnane,
2013,
Advanced Lithography.
Stephen Meyer,
Ralph R. Dammel,
C. Grant Willson,
2001,
SPIE Advanced Lithography.
Jeff D. Byers,
Brian Osborn,
C. Grant Willson,
2000,
Advanced Lithography.
John L. Sturtevant,
Nigel Cave,
Carla Nelson-Thomas,
2001,
SPIE Advanced Lithography.
Timothy A. Brunner,
Allen H. Gabor,
Shailendra Mishra,
2008,
SPIE Advanced Lithography.
Allen H. Gabor,
John M. Cotte,
Colin J. Brodsky,
2008,
SPIE Advanced Lithography.
Marie Angelopoulos,
Sean D. Burns,
Margaret C. Lawson,
2004,
SPIE Advanced Lithography.
Karen Petrillo,
Allen H. Gabor,
Naftali E. Lustig,
2006,
SPIE Advanced Lithography.
C. Grant Willson,
Brian C. Trinque,
Heather F. Johnson,
2001,
SPIE Advanced Lithography.
Dario L. Goldfarb,
Marie Angelopoulos,
Sean D. Burns,
2004,
SPIE Advanced Lithography.
Emily Fisch,
Mark Lawliss,
Jed H. Rankin,
2005,
SPIE Advanced Lithography.
Doris Kang,
Stewart A. Robertson,
Colin J. Brodsky,
2002,
SPIE Advanced Lithography.
Alan C. Thomas,
Martin Ostermayr,
Ian Stobert,
2012
.
Colin J. Brodsky,
William M. Chu,
2006,
SPIE Advanced Lithography.
Alan C. Thomas,
Ian Stobert,
Colin J. Brodsky,
2011,
Advanced Lithography.
Doris Kang,
Stewart A. Robertson,
Colin J. Brodsky,
2002
.
Nelson Felix,
Colin J. Brodsky,
Bernhard R. Liegl,
2007,
SPIE Advanced Lithography.
Doris Kang,
Stewart A. Robertson,
Colin J. Brodsky,
2002,
SPIE Advanced Lithography.
Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Scott Halle,
Marie Angelopoulos,
Karen Petrillo,
2003,
SPIE Advanced Lithography.
Will Conley,
C. Grant Willson,
Mark Somervell,
2000
.
Sean D. Burns,
Colin J. Brodsky,
Ralf Buengener,
2010,
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Will Conley,
C. Grant Willson,
Mark Somervell,
2000
.