M. A. Vyvoda

Effects of plasma conditions on the shapes of features etched in Cl2 and HBr plasmas. I. Bulk crystalline silicon etching

M. V. Malyshev, D. B. Graves, Vincent M. Donnelly, 1998 .

Role of sidewall scattering in feature profile evolution during Cl2 and HBr plasma etching of silicon

M. V. Malyshev, D. B. Graves, Vincent M. Donnelly, 2000 .