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Effects of plasma conditions on the shapes of features etched in Cl2 and HBr plasmas. I. Bulk crystalline silicon etching

M. V. Malyshev, D. B. Graves, Vincent M. Donnelly, 1998 .

Role of sidewall scattering in feature profile evolution during Cl2 and HBr plasma etching of silicon

M. V. Malyshev, D. B. Graves, Vincent M. Donnelly, 2000 .