Takumichi Sutani

Electron beam metrology for advanced technology nodes

Gian Francesco Lorusso, Naoto Horiguchi, Jürgen Bömmels, 2019 .

Spatial signature in local overlay measurements: what CD-SEM can tell us and optical measurements can not

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2010, Advanced Lithography.

Concerning the influence of pattern symmetry on CD-SEM local overlay measurements for double patterning of complex shapes

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2010, Advanced Lithography.

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layers

Takumichi Sutani, Yoshikata Takemasa, Gian F. Lorusso, 2018, Advanced Lithography.

Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2011 .

LER and LWR measurements used for monitoring wiggling and stochastic-failure (Conference Presentation)

Takumichi Sutani, Hiroki Kawada, Takahiro Kawasaki, 2019, Metrology, Inspection, and Process Control for Microlithography XXXIII.