Kars Zeger Troost

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

High-NA EUV lithography exposure tool progress

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2019 .

High-NA EUV Lithography exposure tool: advantages and program progress

Jan van Schoot, Kars Zeger Troost, Judon Stoeldraijer, 2020 .

Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications

Vincent Wiaux, Kars Zeger Troost, Eric Hendrickx, 2020 .

High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Judon Stoeldraijer, 2019 .

High-NA EUV lithography exposure tool progress (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Eelco van Setten, 2018 .