Jo Finders

发表

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

Optimizing i-line lithography for 0.3-μm poly-gate manufacturing

Jo Finders, P. Tzyiatkov, K. Ronse, 1997 .

CD versus pitch across the slit for multiple 248-nm step-and-scan exposure tools

Jo Finders, Robert de Kruif, Richard Bruls, 2002, SPIE Advanced Lithography.

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Jo Finders, Alena Andryzhyieuskaya, 2011, Advanced Lithography.

Scanner qualification with IntenCD based reticle error correction

Jo Finders, Shmoolik Mangan, Ilan Englard, 2010, Advanced Lithography.

NA/σ optimization strategies for an advanced DUV stepper applied to 0.25-μm and sub-0.25-μm critical levels

Geert Vandenberghe, Patrick Jaenen, Kurt G. Ronse, 1997, Advanced Lithography.

CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-μm gate printing

Kurt G. Ronse, Jo Finders, Jan B. van Schoot, 1998, Advanced Lithography.

Lithography assisted self-assembly of contact holes on 300-mm wafer scale

Jo Finders, Sander F. Wuister, Emiel Peeters, 2012 .

Aerial imaging for source mask optimization: mask and illumination qualification

Jo Finders, Shmoolik Mangan, Ilan Englard, 2009, Photomask Technology.

Mask error factor: causes and implications for process latitude

Jo Finders, Jan B. van Schoot, Koen van Ingen Schenau, 1999, Advanced Lithography.

The flash memory battle: How low can we go?

Jo Finders, Eelco van Setten, Mircea Dusa, 2008, SPIE Advanced Lithography.

Alternative mask materials for low-k1 EUV imaging

Jo Finders, Frank J. Timmermans, Claire van Lare, 2019, European Mask and Lithography Conference.

Impact of mask CDU and local CD variation on intra-field CDU

Jo Finders, Junji Miyazaki, Hiroaki Morimoto, 2012, Photomask Technology.

Towards 22 nm: fast and effective intra-field monitoring and optimization of process windows and CDU

Jo Finders, Huixiong Dai, Shmoolik Mangan, 2011, Advanced Lithography.

High-NA EUV lithography exposure tool progress

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2019 .

The lithography technology for the 32 nm HP and beyond

Alek C. Chen, Jo Finders, Hans Meiling, 2008, Photomask Japan.

The impact of Mask 3D and Resist 3D effects in optical lithography

Jo Finders, 2014, Advanced Lithography.

Separable OPC models for computational lithography

Lieve Van Look, Geert Vandenberghe, Jo Finders, 2008, Photomask Japan.

Alternative reticles for low-k1 EUV imaging

Jo Finders, Frank J. Timmermans, M.-Claire van Lare, 2019, Photomask Technology.

ArF solutions for low-k1 back-end imaging

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Litho and patterning challenges for memory and logic applications at the 22-nm node

Lieve Van Look, Jo Finders, Mircea Dusa, 2010, Advanced Lithography.

IntenCD technology for fast and accurate scanner performance determination

Jo Finders, Shmoolik Mangan, Ilan Englard, 2009, Photomask Technology.

Perfect photoresist for 157nm imaging

Will Conley, Jo Finders, Jeff D. Byers, 2001, SPIE Advanced Lithography.

High-NA EUV Lithography exposure tool: advantages and program progress

Jan van Schoot, Kars Zeger Troost, Judon Stoeldraijer, 2020 .

Aberration's impact on subresolution contact hole process windows in ultrathin imaging resist

Michael T. Reilly, Jo Finders, Mircea Dusa, 2003, SPIE Advanced Lithography.

Status of ArF lithography for the 130-nm technology node

Geert Vandenberghe, Frieda Van Roey, Anne-Marie Goethals, 2000, Advanced Lithography.

Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications

Gijsbert Rispens, Chang-Moon Lim, Chang-Nam Ahn, 2018, Advanced Lithography.

Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2009 .

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Timon Fliervoet, Mireille Maenhoudt, 2009, Advanced Lithography.

Metrology challenges for advanced lithography techniques

Jo Finders, Peter Vanoppen, Ilan Englard, 2007, SPIE Advanced Lithography.

ArFi lithogrphy optimization for thin OMOG reticle with fast aerial imaging

Jo Finders, Brid Connolly, Shmoolik Mangan, 2012, Advanced Lithography.

An integrated lithography concept with application on 45-nm ½ pitch flash memory devices

Jo Finders, Andre Engelen, Mircea Dusa, 2006, SPIE Advanced Lithography.

NXE:3300B platform: imaging applications for Logic and DRAM

Guido Schiffelers, Jo Finders, Eelco van Setten, 2013, Other Conferences.

Matching multiple-feature CD response from exposure tools: analysis of error sources with their impact in low-k1 regime

Jo Finders, Mircea Dusa, 2004, SPIE Advanced Lithography.

KrF lithography for 130 nm

Geert Vandenberghe, Kurt G. Ronse, Jo Finders, 2000, Advanced Lithography.

Random 65nm..45nm C/H printing using optimized illumination source and CD sizing by post processing

Jo Finders, Hitoshi Kosugi, Gert-Jan Janssen, 2008, SPIE Advanced Lithography.

Characterizing the imaging performance of flash memory masks using AIMS

Jo Finders, Eelco van Setten, Mircea Dusa, 2008, European Mask and Lithography Conference.

Fundamental study of placement errors in directed self-assembly

Jo Finders, Emiel Peeters, Johannes G. E. M. Fraaije, 2014 .

Improvements in resist performance towards EUV HVM

Gijsbert Rispens, Jo Finders, Marieke Meeuwissen, 2017, Advanced Lithography.

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Tsann-Bim Chiou, Jo Finders, Eric Hendrickx, 2004, Photomask Japan.

The future of EUV lithography: enabling Moore's Law in the next decade

Peter Krabbendam, Judon Stoeldraijer, Jo Finders, 2017, Advanced Lithography.

Optimizing and enhancing optical systems to meet the low k1 challenge

Jo Finders, Oscar Noordman, Jan Baselmans, 2003, SPIE Advanced Lithography.

Performance overview and outlook of EUV lithography systems

Marcel Beckers, Judon Stoeldraijer, Jo Finders, 2015, Advanced Lithography.

Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination

Jo Finders, Sangbong Park, Ting Chen, 2006, SPIE Advanced Lithography.

Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements

Jo Finders, Ute Buttgereit, Thomas Scheruebl, 2010, Advanced Lithography.

Aerial imaging qualification and metrology for source mask optimization

Jo Finders, Shmoolik Mangan, Andre Engelen, 2010, Advanced Lithography.

Litho scenario solutions for FinFET SRAM 22nm node

Tsann-Bim Chiou, Alek C. Chen, Jo Finders, 2009, Lithography Asia.

Mask-absorber optimization: the next phase

Jo Finders, Claire van Lare, Frank Timmermans, 2020, Journal of Micro/Nanolithography, MEMS, and MOEMS.

NXE:3100 full wafer imaging performance and budget verification

Jo Finders, Natalia Davydova, Friso Wittebrood, 2012, European Mask and Lithography Conference.

Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity

Jo Finders, Huixiong Dai, Chris Ngai, 2011 .

Driving imaging and overlay performance to the limits with advanced lithography optimization

Jo Finders, Jan Mulkens, Michael Kubis, 2012, Advanced Lithography.

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Patrick Jaenen, Jo Finders, Mireille Maenhoudt, 2007, SPIE Advanced Lithography.

Mask inspection placement maps for improving overlay

Jo Finders, Robert de Kruif, Shmoolik Mangan, 2009, Photomask Technology.

PSM and thin OMOG reticles aerial imaging metrology comparison study

Jo Finders, Brid Connolly, Shmoolik Mangan, 2012, European Mask and Lithography Conference.

Experimental evaluation of bull's-eye illumination for assist-free random contact printing at sub-65nm node

Geert Vandenberghe, Jo Finders, Andre Engelen, 2006, SPIE Advanced Lithography.

Influence of litho patterning on DSA placement errors

Jo Finders, Bart Laenens, Sander Frederik Wuister, 2014, Advanced Lithography.

Low-k1 imaging: how low can we go?

Jo Finders, Mark Eurlings, Mircea V. Dusa, 2000, Other Conferences.

YieldStar based reticle 3D measurements and its application

Jo Finders, Reinder Plug, Harm Dillen, 2016, Photomask Technology.

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Jo Finders, Jan B. van Schoot, Nakgeuon Seong, 2001, SPIE Advanced Lithography.

High-NA EUV lithography enabling Moore’s law in the next decade

Peter Krabbendam, Judon Stoeldraijer, Jo Finders, 2017, Photomask Technology.

Pattern Displacement Induced by Lens Aberrations

Geert Vandenberghe, Kurt G. Ronse, Jo Finders, 2002, Photomask Technology.

ArF step-and-scan system with 0.75 NA for the 0.10μm node

Jo Finders, Oliver Roempp, Rainer Boerret, 2001, SPIE Advanced Lithography.

Forbidden pitches for 130-nm lithography and below

Jo Finders, Donis G. Flagello, J. Fung Chen, 2000, Advanced Lithography.

High-NA EUV lithography exposure tool progress (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV

Guido Schiffelers, Jo Finders, Laurent Depre, 2014, European Mask and Lithography Conference.

Impact of reticle absorber on the imaging properties in ArFi lithography

Jo Finders, Michael Ben Yishai, S. Mangan, 2012, European Mask and Lithography Conference.

The imaging performance of flash memory masks characterized with AIMS

Jo Finders, Eelco van Setten, Mircea Dusa, 2009, Photomask Japan.

EUV source optimization driven by fundamental diffraction considerations

Jo Finders, Paul van Adrichem, Eelco van Setten, 2017, Photomask Technology.

65-nm full-chip implementation using double dipole lithography

Will Conley, Tsann-Bim Chiou, Jo Finders, 2003, SPIE Advanced Lithography.

Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFi and extreme ultraviolet lithography

Jo Finders, Laurens de Winter, Thorsten Last, 2016 .

Mask 3D effects: impact on imaging and placement

Jo Finders, Thijs Hollink, 2011, European Mask and Lithography Conference.

Experimental verification of a model-based decomposition method for double dipole lithography

Geert Vandenberghe, Tsann-Bim Chiou, Alek Chen, 2004, SPIE Advanced Lithography.

Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield

Jo Finders, Baukje Wisse, Shmoolik Mangan, 2009, Advanced Lithography.

E-beam based EUV mask characterization for studying mask induced wafer effects

Jo Finders, Emily Gallagher, Qing Tian, 2018, Photomask Technology.

Use of 3D metrology for process control

Hideaki Abe, Jo Finders, Toshiaki Fujii, 2009, Advanced Lithography.

A single-exposure approach for patterning 45nm flash/DRAM contact hole mask

Jo Finders, Sangbong Park, Edita Tejnil, 2006, Photomask Japan.

Illumination pupil optimization in 0.33-NA extreme ultraviolet lithography by intensity balancing for semi-isolated dark field two-bar M1 building blocks

Jo Finders, Paul van Adrichem, Laurens de Winter, 2016 .

Masks for flash memory gates for the 45nm node: binary or attenuated?

Jo Finders, Eelco van Setten, Andre Engelen, 2007, European Mask and Lithography Conference.

Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections

Geert Vandenberghe, Jo Finders, Staf Verhaegen, 2006, SPIE Advanced Lithography.

Double patterning for 32nm and below: an update

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2008, SPIE Advanced Lithography.

Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications

Jo Finders, Tilmann Heil, Markus Brotsack, 2004, SPIE Advanced Lithography.

Imaging enhancements by polarized illumination: theory and experimental verification

Jo Finders, Tilmann Heil, Jan Mulkens, 2004, SPIE Advanced Lithography.

0.11-μm imaging in KrF lithography using dipole illumination

Jo Finders, Eelco van Setten, Robert J. Socha, 2001, Microelectronic and MEMS Technologies.

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Jo Finders, Robert John Socha, 2002, SPIE Advanced Lithography.

Mask 3D induced phase and the mitigation by absorber optimization

Jo Finders, Jean Galvier, 2015, Advanced Lithography.

Application challenges with double patterning technology (DPT) beyond 45 nm

Vincent Wiaux, Geert Vandenberghe, Jo Finders, 2006, SPIE Photomask Technology.

Translation of lithography variability into after-etch performance: monitoring of golden hotspot

Amine Lakcher, Jo Finders, Ton Kiers, 2016, European Mask and Lithography Conference.

Solutions for 22-nm node patterning using ArFi technology

Yu Cao, Jan Mulkens, Jo Finders, 2011, Advanced Lithography.

Impact of mask absorber and quartz over-etch on mask 3D induced best focus shifts

Jo Finders, Junji Miyazaki, Marieke van Veen, 2014, European Mask and Lithography Conference.

Can DUV take us below 100 nm?

Jo Finders, Jan B. van Schoot, Donis G. Flagello, 2001, SPIE Advanced Lithography.

Investigation and mitigation of field-edge CDU fingerprint for ArFi lithography for 45-nm to sub-28-nm logic nodes

Jo Finders, Orion Mouraille, Bart Smeets, 2012, European Mask and Lithography Conference.

Contrast optimization for 0.33NA EUV lithography

Gijsbert Rispens, Jo Finders, Friso Wittebrood, 2016, SPIE Advanced Lithography.

Image placement error: closing the gap between overlay and imaging

Jo Finders, Eric Hendrickx, Geert Vandenberghe, 2005 .

EUV lithography performance for manufacturing: status and outlook

Judon Stoeldraijer, Jo Finders, Hans Meiling, 2016, SPIE Advanced Lithography.

An IntenCD map of a reticle as a feed-forward input to DoseMapper

Jo Finders, Lior Shoval, Ilan Englard, 2008, Photomask Japan.

High-NA EUVL exposure tool: key advantages and program status

Jan van Schoot, Judon Stoeldraijer, Jo Finders, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

High-NA EUV lithography exposure tool: key advantages and program progress

Judon Stoeldraijer, Jo Finders, Peter Kuerz, 2021 .

Investigation into a prototype extreme ultraviolet low-n attenuated phase-shift mask

Jo Finders, Paul van Adrichem, Cheuk-Wah Man, 2021 .

Optimizations aspects for EUV low-k1 logic with the low-n mask

Jo Finders, Stephen Hsu, M.-Claire van Lare, 2021, Photomask Technology.

High-NA EUV imaging: from system introduction towards low-k1 extension

Gijsbert Rispens, Jan van Schoot, Jo Finders, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

Experimental investigation of a high-k reticle absorber system for EUV lithography

Jo Finders, Markus Bender, Frank Schurack, 2019, Extreme Ultraviolet (EUV) Lithography X.

CONTACT HOLE IMAGING AT THE 0.13 μm NODE USING KrF LITHOGRAPHY

Jo Finders, Eelco van Setten, Carsten Kohler, 1910 .

DUV LITHOGRAPHY (KrF) FOR 130 nm USING OFF-AXIS ILLUMINATION AND ASSISTING FEATURES

Jan van Schoot, Jo Finders, Mircea Dusa, 1999 .