Eelco van Setten

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

High-NA EUV lithography exposure tool progress

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2019 .

High-NA EUV Lithography exposure tool: advantages and program progress

Jan van Schoot, Kars Zeger Troost, Judon Stoeldraijer, 2020 .

High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Judon Stoeldraijer, 2019 .

High-NA EUV lithography exposure tool progress (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)

Jan van Schoot, Kars Zeger Troost, Eelco van Setten, 2018 .

High-NA EUVL exposure tool: key advantages and program status

Jan van Schoot, Judon Stoeldraijer, Jo Finders, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

High-NA EUV imaging: from system introduction towards low-k1 extension

Gijsbert Rispens, Jan van Schoot, Jo Finders, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

CONTACT HOLE IMAGING AT THE 0.13 μm NODE USING KrF LITHOGRAPHY

Jo Finders, Eelco van Setten, Carsten Kohler, 1910 .