Tilmann Heil

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Zeger Troost, Frank Bornebroek, 2018 .

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Tilmann Heil, Eelco van Setten, Christian Wagner, 2007, SPIE Advanced Lithography.

The future of EUV lithography: enabling Moore's Law in the next decade

Peter Krabbendam, Judon Stoeldraijer, Jo Finders, 2017, Advanced Lithography.

High-NA EUV lithography enabling Moore’s law in the next decade

Peter Krabbendam, Judon Stoeldraijer, Jo Finders, 2017, Photomask Technology.

Imaging budgets for EUV optics: ready for 22-nm node and beyond

Tilmann Heil, Steve Hansen, Paul Gräupner, 2009, Advanced Lithography.

EUV imaging: an aerial image study

Tilmann Heil, Udo Dinger, Martin Lowisch, 2004, SPIE Advanced Lithography.

Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications

Jo Finders, Tilmann Heil, Markus Brotsack, 2004, SPIE Advanced Lithography.

Imaging enhancements by polarized illumination: theory and experimental verification

Jo Finders, Tilmann Heil, Jan Mulkens, 2004, SPIE Advanced Lithography.