Mingxing Wang

发表

A Novel Design of 1024-point Pipelined FFT Processor Based on Cordic Algorithm

Jiangyi Shi, Yinghui Tian, Mingxing Wang, 2012 .

Approaches for Source Retrieval and Text Alignment of Plagiarism Detection Notebook for PAN at CLEF 2013

Mingxing Wang, Leilei Kong, Haoliang Qi, 2013, CLEF.

Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists

Mingxing Wang, Cheng-Tsung Lee, Nathan D. Jarnagin, 2007, SPIE Advanced Lithography.

Resists for sub-100nm patterning at 193nm exposure

Mingxing Wang, Jeanette M. Roberts, Kenneth E. Gonsalves, 2006, SPIE Advanced Lithography.

Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography

Mingxing Wang, Cheng-Tsung Lee, Kenneth E. Gonsalves, 2008, SPIE Advanced Lithography.

A Testing Framework of Adaptive Web Application Based on Multi-agent Collaboration

Mingxing Wang, Jiajing Wu, Wang Yang, 2016 .

Computational insight into dengue virus NS2B-NS3 protease inhibition: A combined ligand- and structure-based approach

Fangfei Li, Mingxing Wang, Junning Chen, 2018, Comput. Biol. Chem..

Design of Plural-Multiplier Based on CORDIC Algorithm for FFT Application

Jiangyi Shi, Yinghui Tian, Mingxing Wang, 2012 .

Novel anionic photoacid generator (PAGs) and photoresist for sub-50-nm patterning by EUVL and EBL

Mingxing Wang, Cheng-Tsung Lee, Kenneth E. Gonsalves, 2007, SPIE Advanced Lithography.

An improvement of continuous tabu search for global optimization

Xi Chen, Mingxing Wang, Jixin Qian, 2004, Fifth World Congress on Intelligent Control and Automation (IEEE Cat. No.04EX788).

High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography

Mingxing Wang, Kenneth E. Gonsalves, Narahari S. Pujari, 2008, SPIE Advanced Lithography.

Further results on the nonlinearity of maximum-length NFSR feedbacks

Dongdai Lin, Mingxing Wang, Yupeng Jiang, 2015, Cryptography and Communications.

Fundamental studies of the properties of photoresists based on resins containing polymer-bound photoacid generators

Mingxing Wang, Cheng-Tsung Lee, Nathan D. Jarnagin, 2006, SPIE Advanced Lithography.

Analysis of Wireless Sensor Networks Behavior for Trustworthiness Evaluation

Ying Zhang, Mingxing Wang, Jun Wang, 2018, Communications in Computer and Information Science.

De Bruijn Sequences from Symmetric Shift Registers

Dongdai Lin, Mingxing Wang, Ming Li, 2015, IACR Cryptol. ePrint Arch..

Energy Efficient Geography-Based Data Forwarding Algorithm for Multi-hop Wireless Sensor Network

Mingxing Wang, Guoqiang Zheng, Yonghai Ning, 2010, 2010 International Conference on Electrical and Control Engineering.

In silico exploration of aryl sulfonamide analogs as voltage-gated sodium channel 1.7 inhibitors by using 3D-QSAR, molecular docking study, and molecular dynamics simulations

Ying Wang, Mingxing Wang, Hailun Jiang, 2018, Comput. Biol. Chem..

Effect of PAG and matrix structure on PAG acid generation behavior under UV and high-energy radiation exposure

Mingxing Wang, Todd R. Younkin, Cheng-Tsung Lee, 2008, SPIE Advanced Lithography.

Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography

Mingxing Wang, Clifford L. Henderson, Jeanette M. Roberts, 2006 .

Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists

Mingxing Wang, Wang Yueh, Kenneth E. Gonsalves, 2008 .

Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography

Mingxing Wang, Clifford L. Henderson, Cheng-Tsung Lee, 2009 .

Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

Mingxing Wang, Jeanette M. Roberts, Wang Yueh, 2007 .

Novel Anionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Mingxing Wang, Jeanette M. Roberts, Wang Yueh, 2006 .

New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography

Mingxing Wang, Wang Yueh, Kenneth E. Gonsalves, 2007 .

Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning

Mingxing Wang, Clifford L. Henderson, Jeanette M. Roberts, 2008 .

Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance

Mingxing Wang, Clifford L. Henderson, Cheng-Tsung Lee, 2007 .

Novel Ionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Mingxing Wang, Wang Yueh, Kenneth E. Gonsalves, 2007 .