D. Nyyssonen

Metrology in Microlithography

D. Nyyssonen, D. Nyyssonen, 1987 .

Focused-Beam Vs. Conventional Bright-Field Scanning Microscopy For Integrated Circuit Metrology

D. Nyyssonen, 1986, Optics & Photonics.

Optical Linewidth Measurements On Silicon And Iron-Oxide Photomasks

D. Nyyssonen, 1977, Other Conferences.

Optical Nondestructive Evaluation At The National Bureau Of Standards

D. Nyyssonen, T. V. Vorburger, C. M. Vest, 1986, Photonics West - Lasers and Applications in Science and Engineering.

Optical Linewidth Measurements On Wafers

D. Nyyssonen, 1978, Other Conferences.

SEM-based System For Calibration Of Linewidth SRMs For The IC industry

D. Nyyssonen, M. T. Postek, 1986, Optics & Photonics.

A New Approach To Image Modeling And Edge Detection In The SEM

D. Nyyssonen, 1988, Advanced Lithography.

Spatial Coherence: The Key To Accurate Optical Micrometrology

D. Nyyssonen, D. Nyyssonen, 1979, Optics & Photonics.

Optical Linewidth Measurement On Patterned Metal Layers

D. Nyyssonen, 1984, Other Conferences.

Optical Linewidth Measurements on Photomasks and Wafers

D. Nyyssonen, W. M. Bullis, D. Nyyssonen, 1982 .