Roman Gouk

Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles

Tong Liu, Roman Gouk, James S. Papanu, 2008, Photomask Technology.

Advanced damage-free photomask cleaning for 45/32nm technology nodes

Roman Gouk, James S. Papanu, Fred Li, 2008, Photomask Japan.

Advanced mask cleaning techniques for sub-100-nm technology nodes

Roman Gouk, Steven Verhaverbeke, James S. Papanu, 2005, SPIE Photomask Technology.

Advanced processes for photomask damage-free cleaning and photoresist removal

Roman Gouk, Steven Verhaverbeke, James S. Papanu, 2006, European Mask and Lithography Conference.

Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning

Roman Gouk, Steven Verhaverbeke, Dennis J. Yost, 2005 .