Alan E. Rosenbluth

发表

A computational technique to optimally design in-situ diffractive elements: applications to projection lithography at the resist resolution limit

Kafai Lai, Assad A. Oberai, Dario Gil, 2009, Advanced Lithography.

Layout optimization method to equalize the best-focus position of different patterns

Alan E. Rosenbluth, Jaione Tirapu-Azpiroz, Timothy Brunner, 2014 .

Optimum mask and source patterns to print a given shape

Kafai Lai, Scott J. Bukofsky, Alfred K. K. Wong, 2001, SPIE Advanced Lithography.

Lithography process model building using locally linear embedding

Babji Srinivasan, Ramya Viswanathan, Alan E. Rosenbluth, 2015, 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).

Modeling polarization for hyper-NA lithography tools and masks

Kafai Lai, Bernhard Kneer, Michael Totzeck, 2007, SPIE Advanced Lithography.

Benefits and trade-offs of global source optimization in optical lithography

Kafai Lai, Dario Gil, Jaione Tirapu-Azpiroz, 2009, Advanced Lithography.

Topics in polarization ray tracing for image projectors

Kafai Lai, Gregg M. Gallatin, Rama N. Singh, 2005, SPIE Optics + Photonics.

Massively-parallel FDTD simulations to address mask electromagnetic effects in hyper-NA immersion lithography

Alan E. Rosenbluth, Geoffrey W. Burr, Jaione Tirapu Azpiroz, 2008, SPIE Advanced Lithography.

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

Kafai Lai, Scott Halle, Aasutosh Dave, 2010, Advanced Lithography.

Decomposition of the TCC using non-coherent kernels for faster calculation of lithographic images

Alan E. Rosenbluth, 2017, Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Isotropic treatment of EMF effects in advanced photomasks

Ioana Graur, Alan E. Rosenbluth, Geoffrey W. Burr, 2009, Photomask Technology.

Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node

Kafai Lai, Lars W. Liebmann, Carlos Fonseca, 2002, SPIE Advanced Lithography.

Multiple stages of regression to improve accuracy in calibrated lithography process models

Babji Srinivasan, Pardeep Kumar, Ramana Murthy Pusuluri, 2018 .

Global optimization of the illumination distribution to maximize integrated process window

Alan E. Rosenbluth, Nakgeuon Seong, A. Rosenbluth, 2006, SPIE Advanced Lithography.

Intensive optimization of masks and sources for 22nm lithography

Kafai Lai, Yuri Granik, Katya Scheinberg, 2009, Advanced Lithography.

Radiometric consistency in source specifications for lithography

Kafai Lai, Michael Totzeck, Alan E. Rosenbluth, 2008, SPIE Advanced Lithography.

Source optimization for three-dimensional image designs through film stacks

Matthew E. Colburn, Dario L. Goldfarb, Alan E. Rosenbluth, 2009, Advanced Lithography.

Applicability of global source mask optimization to 22/20nm node and beyond

Aasutosh Dave, Jason Meiring, Gabriel Berger, 2011, Advanced Lithography.

Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's

Matthew E. Colburn, Kafai Lai, Alan E. Rosenbluth, 2007, SPIE Advanced Lithography.

Illumination optimization method and projection imaging system

Alan E. Rosenbluth, アラン・エドワード・ローゼンブルース, ジョセフ・エドワード・ゴルティッチ, 1996 .

Lithographic image simulation for the 21st century with 19th-century tools

Ronald L. Gordon, Alan E. Rosenbluth, R. L. Gordon, 2004, SPIE Optics + Photonics.