David Melville

A computational technique to optimally design in-situ diffractive elements: applications to projection lithography at the resist resolution limit

Kafai Lai, Assad A. Oberai, Dario Gil, 2009, Advanced Lithography.

Benefits and trade-offs of global source optimization in optical lithography

Kafai Lai, Dario Gil, Jaione Tirapu-Azpiroz, 2009, Advanced Lithography.

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

Kafai Lai, Scott Halle, Aasutosh Dave, 2010, Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Applicability of global source mask optimization to 22/20nm node and beyond

Aasutosh Dave, Jason Meiring, Gabriel Berger, 2011, Advanced Lithography.