S. Heo

A Study of Sputtered TiN Gate Electrode Etching with Various Wet Chemicals and Post Etch Annealing for Complementary Metal–Oxide–Semiconductor Device Integration Applications

M. Choi, C. Choi, Dohyung Kim, 2012 .

Photo-Charging of Li(Ni0.65Co0.15Mn0.20)O2 Lithium-Ion Battery Using Silicon Solar Cells

Cheul‐Ro Lee, Baeksang Yoon, Inseok Seo, 2022, Materials.

Remote plasma atomic layer deposited Al 2 O 3 4H SiC MOS capacitor with remote H 2 plasma passivation and post metallization annealing

R. Choi, C. Choi, Hyun‐Yong Yu, 2015 .

Structural, optical and chemical analysis of zinc sulfide thin film deposited by RF-mganetron sputtering and post deposition annealing

C. Choi, Dohyung Kim, S. Heo, 2013, Metals and Materials International.

Influence of Different Annealing Ambients on the Properties of Zinc Sulfide Prepared by Atomic Layer Deposition

M. Choi, C. Choi, Dohyung Kim, 2013 .

Plasma atomic layer deposited TiN metal gate for three dimensional device applications: Deposition temperature, capping metal and post annealing

Chang Hwan Choi, Seung Chan Heo, C. Choi, 2012 .

Properties of kesterite Cu 2 ZnSnS 4 ( CZTS ) thin films prepared by sol-gel method using two types of solution

C. Choi, Dohyung Kim, S. Heo, 2013 .