Akira Endo

Investigating the effects of laser intensity and pulse duration on 6.7-nm BEUV emission from Gadolinium plasma

Bowen Li, Takeshi Higashiguchi, Noboru Yugami, 2012, Other Conferences.

First generation laser-produced plasma source system for HVM EUV lithography

Hiroshi Komori, Akira Sumitani, Tamotsu Abe, 2010, Advanced Lithography.

Shorter wavelength EUV source around 6.X nm by rare-earth plasma

Takeshi Higashiguchi, Noboru Yugami, Thomas Cummins, 2011, Optical Engineering + Applications.

A 6.7-nm beyond EUV source as a future lithography source

Bowen Li, Takeshi Higashiguchi, Noboru Yugami, 2012, Advanced Lithography.

Laser-produced plasma UTA emission in 3-7nm spectral region

Bowen Li, Takeshi Higashiguchi, Noboru Yugami, 2012, Advanced Lithography.

Time-resolved deformation measurement of Yb:YAG thin disk using wavefront sensor

Tomas Mocek, Klaus Mann, Taisuke Miura, 2015, Photonics West - Lasers and Applications in Science and Engineering.

Precise curvature measurement of Yb:YAG thin disk

Tomas Mocek, Klaus Mann, Taisuke Miura, 2015, Other Conferences.