Se-Hoon Lee

New Source/Drain Hot Carrier Injection Disturbance of NAND Flash Devices

Kinam Kim, Jungdal Choi, Keonsoo Kim, 2010 .

Low Voltage Program/Erase Characteristics of Si Nanocrystal Memory with Damascene Gate FinFET on Bulk Si Wafer

Donggun Park, Byung-Il Ryu, Eun Suk Cho, 2006 .

High Transport Si/SiGe Heterostructures for CMOS Transistors with Orientation and Strain Enhanced Mobility

Injo Ok, Hi-Deok Lee, Jeff Huang, 2010, IEICE Trans. Electron..

TWIn SONOS TransistOR (TWISTOR) for 2-bit/cell SONOS Memory Technology

Byung-Gook Park, Hyungcheol Shin, Donggun Park, 2006, 2006 21st IEEE Non-Volatile Semiconductor Memory Workshop.

Fin-Type Field-Effect Transistor NAND Flash with Nitride/Silicon Nanocrystal/Nitride Hybrid Trap Layer

Donggun Park, I. Chung, J. Choe, 2007 .

Demonstration of $L_{g} \sim \hbox{55}\ \hbox{nm}$ pMOSFETs With $\hbox{Si/Si}_{0.25}\hbox{Ge}_{0.75}/\hbox{Si}$ Channels, High $I_{\rm on}/I_{\rm off}\ (≫ \hbox{5} \times \hbox{10}^{4})$ , and Controlled Short Channel Effects (SCEs)

Hsing-Huang Tseng, S. Datta, R. Jammy, 2008, IEEE Electron Device Letters.

A comprehensive study of growth techniques and characterization of epitaxial Ge1-xCx (111) layers grown directly on Si (111) for MOS applications

S. Banerjee, D. Shahrjerdi, E. Tutuc, 2008 .

High mobility CMOS transistors on Si/SiGe heterostructure channels

Injo Ok, Raj Jammy, P. Y. Hung, 2012 .

on-State Performance Enhancement and Channel-Direction-Dependent Performance of a Biaxial Compressive Strained $ \hbox{Si}_{0.5}\hbox{Ge}_{0.5}$ Quantum-Well pMOSFET Along $ \langle \hbox{110} \rangle$ and $\langle \hbox{100} \rangle$ Channel Directions

Leonard Franklin Register, Raj Jammy, Aneesh Nainani, 2011, IEEE Transactions on Electron Devices.