Michael Armacost

Next generation advanced process control: Leveraging big data and prediction

James Moyne, Brad Schulze, Jimmy Iskandar, 2016, 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Plasma-etching processes for ULSI semiconductor circuits

Richard Wise, Alois Gutmann, Peter D. Hoh, 1999, IBM J. Res. Dev..

The Development of a Collaborative Distance Learning Program to Facilitate Pediatric Problem-based Learning [Book Chapter]

Brent G. Wilson, Michael Armacost, Robin D. Deterding, 1999 .

The evolution of IBM CMOS DRAM technology

John K. DeBrosse, Steven H. Voldman, James S. Nakos, 1995, IBM J. Res. Dev..

Big Data Capabilities Applied to Semiconductor Manufacturing Advanced Process Control

James Moyne, Michael Armacost, Jamini Samantaray, 2016, IEEE Transactions on Semiconductor Manufacturing.

When is bilayer thin-film imaging suitable: comparison with single-layer resists

Scott Halle, Marie Angelopoulos, Qinghuang Lin, 2001, SPIE Advanced Lithography.