Hyuk-Joo Kwon

发表

Dry etching technology of Cr and MoSi layers using high-density plasma source

Boo-Yeon Choi, Hyuk-Joo Kwon, Kwang-Sik Oh, 2001, SPIE Photomask Technology.

Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Seong-Woon Choi, Woo-Sung Han, Hyuk-Joo Kwon, 2005, Photomask Japan.

Implementation of pressure monitoring system(PMS) for ship`s engine performance analysis(SEPA) based on the web

Hyuk-Joo Kwon, Sung-Geun Lee, Hyun-Suk Yang, 2014 .

Site Monitoring of Crews and Passengers on Board by the BLE and PLM Combination

Hyuk-Joo Kwon, Sung-Geun Lee, Hyun-Suk Yang, 2015 .

Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Jin-Su Kim, Boo-Yeon Choi, Hyuk-Joo Kwon, 2002, Photomask Japan.

Comparative evaluation of mask cleaning performance

Hyuk-Joo Kwon, Jin-Min Kim, Dong-Il Park, 2003, SPIE Photomask Technology.

Photomask dry-etching techniques for hard mask

Woo-Sung Han, Hyuk-Joo Kwon, Sung-Won Kwon, 2006, Photomask Japan.

Long-term Monitoring System for Ship's Engine Performance Analysis Based on the Web

Hyuk-Joo Kwon, Sung-Geun Lee, Hyun-Suk Yang, 2015 .

Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing

Hyuk-Joo Kwon, Dae-Woo Kim, Yong-Dae Kim, 2004, Photomask Japan.

Characteristics of Selective MoSiON Etching in a Chlorine Plasma

Boo-Yeon Choi, Hyuk-Joo Kwon, Byung-Soo Chang, 2002, Photomask Technology.

Applications of MICP source for next-generation photomask process

Boo-Yeon Choi, Hyuk-Joo Kwon, Byung-Soo Chang, 2000, Photomask Japan.

A study of post-exposure baking effect for CAR process in photomask fabrication

Hyuk-Joo Kwon, Sang-Soo Choi, Jin-Min Kim, 2003, Photomask Japan.

Requirements of nano-machining repair system for 45-nm node

Han-Ku Cho, Hyuk-Joo Kwon, Sang-Gyun Woo, 2007, Photomask Japan.

A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect

Seong-Woon Choi, Woo-Sung Han, Hyuk-Joo Kwon, 2005, SPIE Photomask Technology.

Dry etching of Cr layer and its loading effect

Boo-Yeon Choi, Hyuk-Joo Kwon, Byung-Soo Chang, 2001, Photomask Japan.

Loading effect parameters of dry etcher system and their analysis in mask-to-mask loading and within-mask loading

Boo-Yeon Choi, Hyuk-Joo Kwon, Byung-Soo Chang, 2002, SPIE Photomask Technology.

The study of optical performance for quartz dry etching quality in ArF lithography

Seong-Woon Choi, Woo-Sung Han, Hyuk-Joo Kwon, 2006, SPIE Photomask Technology.

Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Hyuk-Joo Kwon, Yong-Dae Kim, Jin-Min Kim, 2003, SPIE Photomask Technology.

Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Boo-Yeon Choi, Hyuk-Joo Kwon, Byung-Soo Chang, 2002, European Mask and Lithography Conference.

Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Hyuk-Joo Kwon, Sang-Soo Choi, Jin-Min Kim, 2003, Photomask Japan.

Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Hyuk-Joo Kwon, Sang-Soo Choi, Jin-Min Kim, 2003, Photomask Japan.

Low price type inspection and monitoring system of lithium ion batteries for hybrid vessels

Hyuk-Joo Kwon, Sung-Geun Lee, Min-kwon Kim, 2016 .

Lifetime test of batteries for BLE modules for site identification of vessel's crews and passengers (SIVCP)

Hyuk-Joo Kwon, Sung-Geun Lee, Min-Gwon Kim, 2015 .

A study on the control algorithm of power converter for gyro wave power generator

Sun-Kwon Lee, Gyu-Hong Kang, Hyuk-Joo Kwon, 2018 .

Application of multiple-wavelength absorption endpoint system in photomask dry etcher

Boo-Yeon Choi, Hyuk-Joo Kwon, Soo-Hong Jeong, 2002, Photomask Japan.

Raman spectra of indium nitride thin films grown by microwave‐excited metalorganic vapor phase epitaxy on (0001) sapphire substrates

Hyuk-Joo Kwon, Akira Yoshida, Osamu Miki, 1996 .