Yil Wook Kim

Comparison of deep silicon etching using SF6/C4F8 and SF6/C4F6 plasmas in the Bosch process

Chang-Koo Kim, Jaisuk Yoo, Chang-Koo Kim, 2008 .

Material characteristics of electrically tunable zirconium oxide thin films

Igor Levin, Jane P. Chang, Byeong-Ok Cho, 2003 .