T. Kumise

The vertical test structure for measuring contact resistance between two kinds of metal

S. Ido, M. Imai, T. Kumise, 1990, Proceedings of the 1991 International Conference on Microelectronic Test Structures.

Evaluation of New Molecular Resist for EUV Lithography

I. Nishiyama, J. Onodera, H. Oizumi, 2007 .

Patterning capability of new molecular resist in EUV lithography

I. Nishiyama, A. Yamaguchi, J. Onodera, 2007 .

<100> channel strained-SiGe p-MOSFET with enhanced hole mobility and lower parasitic resistance

S. Nakamura, M. Shima, T. Kumise, 2002, 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303).