H. Sailer

Investigations on the mechanism of silicon etching with chlorine-trifluoride

D. Kern, A. Urban, M. Irmscher, 2005 .

Adjustable sidewall slopes by electron-beam exposure layout

J. Burghartz, H. Schift, V. Guzenko, 2017 .

Evaluation of calixarene—derivatives as high-resolution negative tone electron-beam resists

D. Kern, V. Schurig, H. Sailer, 2002 .

High resolution electron beam lithography using a chemically amplified calix[4]arene based resist

D. Kern, W. Henschel, V. Schurig, 2004 .

Studies on sensitivity and etching resistance of calix[4]arene derivatives as negative tone electron beam resists

Holger Sailer, Volker Schurig, Dieter P. Kern, 2003 .

Low-Power Organic Light Sensor Array Based on Active-Matrix Common-Gate Transimpedance Amplifier on Foil for Imaging Applications

Yiannos Manoli, Hans Zappe, Joachim N. Burghartz, 2020, IEEE Journal of Solid-State Circuits.

Micro-hybrid system in polymer foil based on adaptive layout

J. N. Burghartz, C. Harendt, H. Richter, 2016, 2016 6th Electronic System-Integration Technology Conference (ESTC).

A chemically amplified calix649arene-based electron-beam resist

H. Sailer, 2004 .