G. Borvon

Recent developments on PULSION® PIII tool: FinFET 3D doping, high temp implantation, III-V doping, contact and silicide improvement, & 450 mm

F. Torregrosa, L. Roux, Y. Spiegel, 2015, 2015 15th International Workshop on Junction Technology (IWJT).

Implantation and metrology solutions for low energy boron implant on 450mm wafers

F. Torregrosa, G. Borvon, M. Schuhmacher, 2014, 2014 20th International Conference on Ion Implantation Technology (IIT).

Mechanisms Involved in the Conversion of ppHMDSO Films into SiO2‐Like by Oxygen Plasma Treatment

Arie Lee, C. Leteinturier, A. Goullet, 2006 .

Efficient and low-damage nitrogen doping of graphene via plasma-based methods

D. Aubel, Laurent Simon, L. Roux, 2016 .

Ex-situ Hydrogenation of Sputtered Transparent Conductive Oxide layers by Plasma Immersion Ion Implantation

A. Kaminski, Q. Rafhay, S. Dubois, 2020, 2020 47th IEEE Photovoltaic Specialists Conference (PVSC).

Analysis of Low-k Organosilicon and Low-Density Silica Films Deposited in HMDSO Plasmas

G. Turban, A. Goullet, G. Borvon, 2002 .

Electrical properties of low-dielectric-constant films prepared by PECVD in O2/CH4/HMDSO

Antoine Goullet, A. Goullet, Agnès Granier, 2002 .

Effect of the ion bombardment energy on silicon dioxide films deposited from oxygen/tetraethoxysilane plasmas in a helicon reactor

G. Turban, A. Goullet, D. Goghero, 2005 .

Hydrogenation of sputtered ZnO:Al layers for double side poly-Si/SiOx solar cells

A. Kaminski, Q. Rafhay, S. Dubois, 2022, EPJ Photovoltaics.

Nitride stress inversion using plasma immersion ion implantation processes

F. Milési, M. Coig, L. Lachal, 2022, MRS Advances.