Harm C M Knoops

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Adriana Szeghalmi, Jon Henri, Akhil Sharma, 2018, ACS applied materials & interfaces.

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma.

Viljami Pore, W. Kessels, Koen de Peuter, 2015, ACS applied materials & interfaces.