Wen-an Loong

发表

Very simple data processing system for deep submicron nanofabrication

Shyi-Long Shy, Tan Fu Lei, C. H. Chu, 1994, Advanced Lithography.

TiSix as a new embedded material for attenuated phase-shift mask

Shyi-Long Shy, Wen-an Loong, Tzu-ching Chen, 1996, Advanced Lithography.

Mix-and-match lithography technology on 6-in. wafers for nanofabrication

Shyi-Long Shy, Tan Fu Lei, Wen-an Loong, 1995, Photomask Technology.

KeV ion-beam-exposed PMIPK and PPIPK

Wen-an Loong, Nien-tsu Peng, W. Loong, 1990, Advanced Lithography.

Simulation and fabrication of a new phase-shifting mask for 0.35 um contact hole pattern transfer: half-tone rim

Shyi-Long Shy, Wen-an Loong, Y. L. Chou, 1994, Photomask Technology.

Powerful inspection and metrology tool for micro- and nanofabrication

Shyi-Long Shy, Tan Fu Lei, Wen-an Loong, 1995, Photomask Technology.

Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm

Wen-an Loong, Cheng-ming Lin, Keh-wen Chang, 1999, Advanced Lithography.

Conducting poly(aniline-co-N-propanesulfonic acid aniline) (PAPSAH) as charge dissipation layer for e-beam lithography

Shyi-Long Shy, Tan Fu Lei, Chun-Yen Chang, 1996, Photomask Technology.

Application of AlSi-based materials on approach of chemical stability of embedded layer for bilayer attenuated phase-shifting mask in 193-nm lithography

Wen-an Loong, Cheng-Ming Lin, 2002, Photomask Japan.

Simulation study of a new phase-shifting mask: halftone-rim

Shyi-Long Shy, Wen-an Loong, Chin-hwa Yeh, 1995, Advanced Lithography.

Photoacid catalyzed main chain scission of poly(butene-1 sulfone) as a deep UV positive resist

Wen-an Loong, W. Loong, Hsien-wu Chang, 1991 .

Simulations of Mask Error Enhancement Factor in 193 nm Immersion Lithography

Wen-an Loong, Kwei-tin Yeh, 2006 .

Regular paper: Poly(dimethyl-co-diphenylsilane) as a deep-UV and an oxygen plasma portable conformable mask

Wen-an Loong, Tsung-hsiung Wang, 1992 .