Jeffrey Mileham

Process tool monitoring and matching using interferometry technique

Doug Anberg, David M. Owen, Eric Bouche, 2016, SPIE Advanced Lithography.

Wafer-shape based in-plane distortion predictions using superfast 4G metrology

David Laidler, Richard van Haren, Leon van Dijk, 2017, Advanced Lithography.

The use of CGS technology in a 3D manufacturing environment

Doug Anberg, David M. Owen, Jeffrey Mileham, 2016, 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Intra-field stress impact on global wafer deformation

Richard van Haren, Leon van Dijk, Jan Hermans, 2019, Advanced Lithography.

Study of correlation between overlay and displacement measured by Coherent Gradient Sensing (CGS) interferometry

Yasushi Tanaka, Byoung-Ho Lee, Doug Anberg, 2016, SPIE Advanced Lithography.

Chamber distortion control in a high volume manufacturing foundry environment

Frida Liang, David M. Owen, Jeffrey Mileham, 2017, 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO).

Wafer-shape metrics based foundry lithography

Frida Liang, Eric Bouche, Sean Lee, 2017, Advanced Lithography.

Chamber distortion control in a high volume manufacturing foundry environment

Frida Liang, David M. Owen, Jeffrey Mileham, 2017, ASMC 2017.