Koutarou Sho

Influence of the watermark in immersion lithography process

Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, 2005, SPIE Advanced Lithography.

Effect of post development process for resist roughness

Koutarou Sho, Shinichi Ito, Tsuyoshi Shibata, 2005, SPIE Advanced Lithography.

Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process

Koutarou Sho, Shinji Yamaguchi, Satoshi Usui, 2016, Advanced Lithography.

Immersion resist process for 32-nm node logic devices

Shoji Mimotogi, Koutarou Sho, Shinichi Ito, 2008, SPIE Advanced Lithography.

The resist-core spacer patterning process for fabrication of 2xnm node semiconductor devices

Koji Hashimoto, Koutarou Sho, Kentaro Matsunaga, 2011, Advanced Lithography.