Satoru Shimura

发表

Influence of the watermark in immersion lithography process

Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, 2005, SPIE Advanced Lithography.

Optimization of equipment for 193-nm immersion processing

Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, 2005, SPIE Advanced Lithography.

193nm immersion process defect generation and reduction mechanism investigation using analytical methods

Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, 2006, SPIE Advanced Lithography.

Robustness of interactive pattern fidelity error as a quality metric for integrated patterning

Satoru Shimura, Shinji Kobayashi, Masashi Enomoto, 2019, Advanced Lithography.

Implementation of double patterning process toward 22-nm node

Satoru Shimura, Tetsu Kawasaki, Hiroki Murakami, 2009, Lithography Asia.

Investigation of a methodology for in-film defects detection on film coated blank wafers

Satoru Shimura, Akiko Kiyotomi, Arnaud Dauendorffer, 2014, Advanced Lithography.

Enabling 35nm double patterning contact imaging using a novel CD shrink process

Satoru Shimura, Tetsu Kawasaki, Yoshitsugu Tanaka, 2008, SPIE Advanced Lithography.

Investigation of lithographic feature characteristics using UV cure as a pitch doubling stabilization technology for the 32nm node and beyond

Satoru Shimura, Karen Petrillo, Matthew E. Colburn, 2010, Advanced Lithography.

The optimizations of resist shrink process using track-based technology

Takashi Saito, Satoru Shimura, Yoshihiro Kondo, 2010, Advanced Lithography.

Fabrication of 22-nm poly-silicon gate using resist shrink technology

Satoru Shimura, Tetsu Kawasaki, Masato Kushibiki, 2009, Advanced Lithography.

CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes

Satoru Shimura, Philippe Foubert, Kathleen Nafus, 2020, Advanced Lithography.

Fine trench patterns with double patterning and trench shrink technology

Yuuki Ishii, Satoru Shimura, Tetsu Kawasaki, 2009, Advanced Lithography.

Analyzing block placement errors in SADP patterning

Carlos Fonseca, Satoru Shimura, Shinji Kobayashi, 2016, SPIE Advanced Lithography.

Manufacturability improvements in EUV resist processing toward NXE:3300 processing

Anne-Marie Goethals, Satoru Shimura, Philippe Foubert, 2014, Advanced Lithography.

New method removing SEM image noise to characterize CD and LWR

Satoru Shimura, Shinji Kobayashi, Masashi Enomoto, 2019, Advanced Lithography.

Defectivity reduction studies for ArF immersion lithography

Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, 2007, SPIE Advanced Lithography.

Pattern uniformity control in integrated structures

Carlos Fonseca, Satoru Shimura, Shinji Kobayashi, 2017, Advanced Lithography.

Metal containing material processing on coater/developer system

Hiroshi Nakamura, Satoru Shimura, Shinichiro Kawakami, 2016, SPIE Advanced Lithography.

Fabrication of 32-nm contact/via hole by photolithographic-friendly method

Satoru Shimura, Tetsu Kawasaki, Mark Somervell, 2008, SPIE Advanced Lithography.

Consideration of missing defect suppression technique in EUV hole patterning

Satoru Shimura, Arisa Hara, Takahiro Shiozawa, 2020, Advanced Lithography.

Robust lithography application to prevent resist poisoning in BEOL

Satoru Shimura, Tetsu Kawasaki, Mitsuaki Iwashita, 2003, SPIE Advanced Lithography.

High-etching selectivity of spin-on-carbon hard mask process for 22nm node and beyond

Satoru Shimura, Hidetami Yaegashi, Kenichi Oyama, 2012, Other Conferences.

Explorations of missing hole defect in EUV patterning

Satoru Shimura, Soichiro Okada, Arisa Hara, 2020, Advanced Lithography.

LWR reduction by novel lithographic and etch techniques

Satoru Shimura, Tetsu Kawasaki, Shinji Kobayashi, 2010, Advanced Lithography.

Advanced resist process enabling implementation of CD controllability for 32 nm and beyond

Satoru Shimura, Tetsu Kawasaki, Hidetami Yaegashi, 2008, SPIE Advanced Lithography.

Advanced multi-patterning using resist core spacer process for 22nm node and beyond

Satoru Shimura, Hidetami Yaegashi, Kenichi Oyama, 2012, Other Conferences.

Important challenges for line-width-roughness reduction

Satoru Shimura, Tetsu Kawasaki, Hiroki Murakami, 2009, Advanced Lithography.

Monte Carlo simulation of edge placement error

Carlos Fonseca, Satoru Shimura, Shinji Kobayashi, 2018, Advanced Lithography.

Transfer mechanism of defects on topcoat to resist pattern in immersion lithography process and effects on etching process

Satoru Shimura, Tetsu Kawasaki, Nobuhiro Takahashi, 2007, SPIE Advanced Lithography.

Addressing EUV patterning challenges towards the limits of NA 0.33 EUV exposure

Makoto Muramatsu, Satoru Shimura, Philippe Foubert, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)

Satoru Shimura, Danilo De Simone, Philippe Foubert, 2021, Advanced Lithography.

Enabling EUV pattern transfer by optimized under layer

Satoru Shimura, Soichiro Okada, Keisuke Yoshida, 2021, Advanced Lithography.

EUV defect reduction activities using coater/developer and etching technique

Satoru Shimura, Kathleen Nafus, Kenta Ono, 2021, Advanced Lithography.

Coater/developer and new underlayer application to sub-30nm process

Satoru Shimura, Shinichiro Kawakami, Naoki Shibata, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

Characterization and Control of Hole Missing Defect in EUV Patterning

Satoru Shimura, Hidetami Yaegashi, Soichiro Okada, 2019, Journal of Photopolymer Science and Technology.