Sung-Gon Jung

Assessments on process parameters' influences to the proximity correction

Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, 2004, SPIE Advanced Lithography.

AF fixer: new incremental OPC method for optimizing assist feature

Joo-Tae Moon, Woo-Sung Han, Sung-Woon Choi, 2008, Photomask Japan.

The application criterion of model-based optical proximity correction in a low k1 process

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Improving model-based OPC performance for sub-60nm devices using real source optical model

Insung Kim, Gi-Sung Yeo, Han-Ku Cho, 2006, SPIE Advanced Lithography.

Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Jung-hyun Lee, Insung Kim, Gi-Sung Yeo, 2002, SPIE Advanced Lithography.

Improving model prediction accuracy for ILT with aggressive SRAFs

David Kim, Seoung-woon Choi, Sung-Woo Lee, 2010, Photomask Technology.