Stephanie W. Butler

发表

Issues and Solutions for Applying Process Control to Semiconductor Manufacturing

Stephanie W. Butler, 1997 .

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1997 .

Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities

Christopher A. Bode, Juergen Hahn, Thomas F. Edgar, 2000, Autom..

Elements for successful sensor-based process control {Integrated Metrology}

Stephanie W. Butler, 1998 .

Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry

S. W. Butler, Stephanie W. Butler, J. A. Stefani, 1994 .

Run by run advanced process control of metal sputter deposition

Duane S. Boning, Taber H. Smith, Jerry A. Stefani, 1998, ICMTS 1998.

Integration of in situ spectral ellipsometry with MMST machine control

Steven A. Henck, S. W. Butler, Stephanie W. Butler, 1994 .

Semiconductor Factory Control and Optimization

Marylyn Hoy Bennett, Stephanie W. Butler, Tom Winter, 1999 .

First-wafer effect on ellipsometer metrics and spatial etch pattern of polysilicon gate etch

Jerry A. Stefani, Stephanie W. Butler, 1994, Other Conferences.

Process Control Concepts

Stephanie W. Butler, 1997 .

DRY ETCH PROCESSES AND SENSORS

P. K. Mozumder, Jerry A. Stefani, Steven A. Henck, 1994 .

A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1999 .

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor ETCH Process: Impact of Measurement Selection and Data Treatment on Sensitivity

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1997 .

STATISTICAL METHODS FOR SEMICONDUCTOR MANUFACTURING

Duane S. Boning, Jerry A. Stefani, S. W. Butler, 1999 .

Sensor integration into plasma etch reactors of a developmental pilot line

Amy Unruh, P. K. Mozumder, Jerry A. Stefani, 1994 .

Spatial characterization of wafer state using principal component analysis of optical emission spectra in plasma etch

Duane S. Boning, S. W. Butler, Stephanie W. Butler, 1997 .

On‐Line Inference of Plasma Etch Uniformity Using In Situ Ellipsometry

Jerry A. Stefani, Stephanie W. Butler, 1994 .

Intelligent model‐based control system employing in situ ellipsometry

Jerry A. Stefani, Steven A. Henck, Stephanie W. Butler, 1994 .