Hayley Johanesen

Statistical significance of STEM based metrology on advanced 3D transistor structures

Laurens Kwakman, Anne Kenslea, Hayley Johanesen, 2019, Advanced Lithography.

Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

Michael Strauss, Anne Kenslea, Hayley Johanesen, 2019, Advanced Lithography.

CD metrology for EUV lithography and etch

Ilan Englard, Matt Knowles, Shimon Levi, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

A holistic metrology sensitivity study for pattern roughness quantification on EUV patterned device structures with mask design induced roughness

Brid Connolly, Gaoliang Dai, Ilan Englard, 2018, Metrology, Inspection, and Process Control for Microlithography XXXII.