Frieda Van Roey

Line edge roughness metrology: recent challenges and advances toward more complete and accurate measurements

Evangelos Gogolides, Vassilios Constantoudis, Gian F. Lorusso, 2018, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Characterization of extreme ultraviolet resists with interference lithography

Yasin Ekinci, Roel Gronheid, Frieda Van Roey, 2006 .

Recent Advancements in EUV Resist Materials and Process Performance

Frieda Van Roey, Anne Marie Goethals, Ardman Niroomand, 2011 .

Spectral analysis of line width roughness and its application to immersion lithography

Gian Francesco Lorusso, Peter Leunissen, Nadia Vandenbroeck, 2006 .

Fluid-photoresist interactions and imaging in high-index immersion lithography

Geert Vandenberghe, Eric Hendrickx, Roger H. French, 2009 .

EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner

Anne-Marie Goethals, Ardavan Niroomand, Ivan Pollentier, 2012 .

High Refractive Index Fluid Evaluations at 193 nm : Technical Paper Fluid Lifetime and Fluid / Resist Interaction Studies

Eric Hendrickx, Roger H. French, Frieda Van Roey, 2008 .