D. Macintyre

High Mobility III-V MOSFETs For RF and Digital Applications

A. Asenov, P. Fejes, X. Li, 2007, 2007 IEEE International Electron Devices Meeting.

Electron beam lithography process for T- and Γ-shaped gate fabrication using chemically amplified DUV resists and PMMA

Stephen Thoms, Yifang Chen, S. Thoms, 1999 .