Rene Carpaij

Experimental verification of high-NA imaging simulations using SHARP

Vincent Wiaux, Anton van Oosten, Timon Fliervoet, 2020, Photomask Technology.

In-line lithography cluster monitoring and control using integrated scatterometry

David Laidler, Ivan Pollentier, Youri van Dommelen, 2004, SPIE Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Optimizing and enhancing optical systems to meet the low k1 challenge

Jo Finders, Oscar Noordman, Jan Baselmans, 2003, SPIE Advanced Lithography.

Characterization of integrated optical CD for process control

Ivan Pollentier, Youri van Dommelen, Lawrence Lane, 2004, SPIE Advanced Lithography.

Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator

Scott Halle, Richard Johnson, Hirokazu Kato, 2011, Advanced Lithography.

Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections

Geert Vandenberghe, Jo Finders, Staf Verhaegen, 2006, SPIE Advanced Lithography.

Etch, reticle, and track CD fingerprint corrections with local dose compensation

Oscar Noordman, Jan van Schoot, Youri van Dommelen, 2005, SPIE Advanced Lithography.