文
论文分享
演练场
杂货铺
论文推荐
字
编辑器下载
登录
注册
Kevin Thomas
发表
Inductively coupled plasma deep etching of InP/InGaAsP in Cl2/CH4/H2 based chemistries with the electrode at 20 °C
Brian Corbett, Frank H. Peters, Vladimir Djara, 2012 .