P. P. Apte

发表

Rapid thermal multiprocessing for a programmable factory for adaptable manufacturing of ICs

Charles D. Schaper, Mehrdad M. Moslehi, Krishna C. Saraswat, 1994 .

A model-based approach for process design and its application to the titanium salicide process

S. Rao, Sharad Saxena, Jorge Kittl, 1998 .

Automatic synthesis of equipment recipes from specified wafer-state transitions

S. Rao, Sharad Saxena, P. K. Mozumder, 1997 .

Rapid thermal multiprocessing using multivariable control of circularly symmetric 3 zone lamp

Krishna C. Saraswat, P. P. Apte, 1992, 1992 Symposium on VLSI Technology Digest of Technical Papers.

Process Modeling and Integration of The Salicide Process Module for Sub-Half Micron Technology.

Jorge Kittl, P. P. Apte, Douglas A. Prinslow, 1995 .

Correlation of trap generation to charge-to-breakdown (Q/sub bd/): a physical-damage model of dielectric breakdown

P. P. Apte, K. C. Saraswat, 1994 .

Modeling ultrathin dielectric breakdown on correlation of charge trap-generation to charge-to-breakdown

P. P. Apte, K. Saraswat, K.C. Saraswat, 1994, Proceedings of 1994 IEEE International Reliability Physics Symposium.

Demonstration of Multiprocessing by Silicon Epitaxy Following In-Situ Cleaning

Mehrdad M. Moslehi, Krishna C. Saraswat, Ramnath Venkatraman, 1991 .

Thermally Driven In-Situ Removal of Native Oxide Using Anhydrous Hydrogen Fluoride

C. R. Helms, P. P. Apte, K. Saraswat, 1993 .

Yield Prediction Under Non-Standard Data Distributions

P. K. Mozumder, Joseph C. Davis, P. P. Apte, 1998 .

Kinetics and nucleation model of the C49 to C54 phase transformation in TiSi2 thin films on deep‐sub‐micron n+ type polycrystalline silicon lines

P. P. Apte, J. Kittl, M. Pas, 1995 .

Process Design & Integration of Salicide and Source/Drain Process Modules for Improved Device Performance

P. P. Apte, J. Kittl, T. Breedijk, 1998 .

A thickness model for the TiSi2TiN stack in the titanium salicide process module

P. P. Apte, J. Tsai, 1995 .

Use of a TiN cap to attain low sheet resistance for scaled TiSi2 on sub-half-micrometer polysilicon lines

P. P. Apte, A. Paranjpe, G. Pollack, 1996, IEEE Electron Device Letters.

Constant Current Stress Breakdown in Ultrathin SiO2 Films

P. P. Apte, K. Saraswat, T. Kubota, 1993 .