Lipkong Yap

Overlay target selection for 20-nm process on A500 LCM

Vidya Ramanathan, Lokesh Subramany, Tal Itzkovich, 2015, Advanced Lithography.

Integrated production overlay field-by-field control for leading edge technology nodes

Chen Li, Young Ki Kim, John C. Robinson, 2014, Advanced Lithography.

Innovative techniques for improving overlay accuracy by using DCM (device correlated metrology) targets as reference

David Tien, Eran Amit, Howard Chen, 2014, Advanced Lithography.

CPE run-to-run overlay control for High Volume Manufacturing

John C. Robinson, Christian Sparka, Bill Pierson, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Advanced overlay: sampling and modeling for optimized run-to-run control

John C. Robinson, Karsten Gutjahr, Lokesh Subramany, 2016, SPIE Advanced Lithography.

Innovative fast technique for overlay accuracy estimation using archer self calibration (ASC)

David Tien, Eran Amit, Charlie Chen, 2014, Advanced Lithography.

HVM capabilities of CPE run-to-run overlay control

John C. Robinson, Karsten Gutjahr, Christian Sparka, 2015, Advanced Lithography.

20nm MOL overlay case study

Michael Hsieh, David Cho, Vidya Ramanathan, 2014, Advanced Lithography.

Techniques for improving overlay accuracy by using device correlated metrology targets as reference

David Tien, Eran Amit, Howard Chen, 2014 .