Janet Chambers

发表

Lithographic and chemical contrast of single-component top-surface imaging (TSI) resists

Roger F. Sinta, Theodore H. Fedynyshyn, John M. Hutchinson, 1998, Advanced Lithography.

Progress in 193-nm top-surface imaging process development

David R. Wheeler, Guojing Zhang, John M. Hutchinson, 1998, Advanced Lithography.

Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation

Jonathan L. Cobb, Robert L. Brainard, Veena Rao, 1999 .