R. Rammula

发表

Atomic layer deposition of high-permittivity TiO2 dielectrics with low leakage current on RuO2 in TiCl4-based processes

J. Aarik, T. Uustare, B. Hudec, 2012 .

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)(3) and H2O

K. Kukli, J. Aarik, A. Aidla, 2014 .

Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films

J. Aarik, H. Mändar, L. Aarik, 2019, Optical Materials.

Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor

J. Aarik, T. Uustare, B. Hudec, 2013 .

Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes

J. Aarik, H. Mändar, L. Aarik, 2020 .

Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition

K. Kukli, J. Kozlova, H. Castán, 2022, Nanomaterials.

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

J. Aarik, V. Sammelselg, H. Mändar, 2014 .

XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon

T. Käämbre, J. Aarik, V. Sammelselg, 2007 .

Effects of precursors on nucleation in atomic layer deposition of HfO2

T. Käämbre, J. Aarik, A. Aidla, 2004 .

Atomic Layer Deposition of High-k Oxides on Graphene

J. Kozlova, J. Aarik, V. Sammelselg, 2011, 1109.4026.

Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current

J. Aarik, H. Mändar, B. Hudec, 2013 .

Atomic layer deposition of aluminum oxide films on graphene

J. Kozlova, J. Aarik, L. Matisen, 2013 .

Atomic layer deposition of high-k dielectrics on carbon nanoparticles

K. Kukli, J. Kozlova, J. Aarik, 2013 .

Structural characterization of TiO2–Cr2O3 nanolaminates grown by atomic layer deposition

J. Aarik, Jun Lu, T. Uustare, 2010 .

Effect of phase composition on X-ray absorption spectra of ZrO2 thin films

T. Käämbre, J. Aarik, T. Uustare, 2007 .

Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties

J. Aarik, T. Uustare, V. Sammelselg, 2008 .

Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone

K. Kukli, T. Käämbre, H. Castán, 2021, Nanotechnology.

Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films

J. Aarik, L. Aarik, R. Rammula, 2016 .

Influence of growth temperature on the structure and electrical properties of high‐permittivity TiO2 films in TiCl4‐H2O and TiCl4‐O3 atomic‐layer‐deposition processes

J. Aarik, H. Mändar, B. Hudec, 2014 .

Atomic layer deposition of TiO2 from TiCl4 and O3

Jaan Aarik, Hugo Mändar, Väino Sammelselg, 2013 .

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Jaan Aarik, Aarne Kasikov, Hugo Mändar, 2006 .

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

J. Aarik, V. Sammelselg, H. Mändar, 2010 .

Atomic layer deposition of epitaxial HfO_2 thin films on r-cut sapphire

J. Aarik, A. Aidla, H. Mändar, 2013 .

Growth of TixAl1 − xOy films by atomic layer deposition using successive supply of metal precursors

J. Aarik, L. Aarik, R. Rammula, 2015 .

Nanoscale characterization of TiO(2) films grown by atomic layer deposition on RuO(2) electrodes.

C. Hwang, L. Frey, M. Rommel, 2014, ACS applied materials & interfaces.

Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer

J. Aarik, E. Dobročka, B. Hudec, 2011 .

Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure

J. Aarik, H. Mändar, L. Aarik, 2015 .