H. Yaguchi

OBPL for the best solution to resist outgassing and out-of-band issues in EUVL toward 1Xnm hp

Noriaki Fujitani, Ryuji Onishi, Rikimaru Sakamoto, 2014, Advanced Lithography.

Photoinduced unzipping depolymerization of poly(olefin sulfone)s possessing photobase generator and base amplifier

H. Yaguchi, T. Sasaki, 2009 .

Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

T. Kondo, Y. Naka, H. Yaguchi, 2012 .

Photoinduced Depolymerization of Poly(olefin sulfone)s Possessing Photobase Generating Groups in the Side Chain

H. Yaguchi, T. Sasaki, 2007 .

Russia’s Security Policy in the 1830s: A Perspective on the Commitment Problem

H. Yaguchi, 2021, Russian and East European Studies.