J. Severi

Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography

D. de Simone, S. De Gendt, J. Severi, 2020, Polymers.

Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation

Myungwoong Kim, D. de Simone, Su-Mi Hur, 2019, Polymers.

Extraction of roughness measurements from thin resists with low signal-to-noise-ratio (SNR) SEM images by applying deep learning denoiser

D. de Simone, P. Leray, G. Lorusso, 2022, Photomask Technology.

High throughput scanning probe metrology for high-NA EUV photoresist profiling

P. Leray, G. Lorusso, A. Charley, 2022, Metrology, Inspection, and Process Control XXXVI.

SEM image denoising with unsupervised machine learning for better defect inspection and metrology

Magdy A. Bayoumi, Joren Severi, Sandip Halder, 2021, Advanced Lithography.

One metric to rule them all: new k4 definition for photoresist characterization

D. De Simone, T. A. Brunner, G. Rispens, 2020, Advanced Lithography.