Bartosz Bilski

High-NA EUV imaging: challenges and outlook

Jan van Schoot, Eelco van Setten, Jörg Zimmermann, 2019, European Mask and Lithography Conference.

High NA EUV lithography: Next step in EUV imaging

Timon Fliervoet, Jan van Schoot, Stephen Hsu, 2019, Advanced Lithography.

Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

Friso Wittebrood, Timon Fliervoet, Mark van de Kerkhof, 2017, European Mask and Lithography Conference.

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Leon Levasier, Roderik van Es, 2017, Advanced Lithography.